Design of atmospheric pressure plasma CVD process for deposition of silicon nitride thin films using dielectric barrier discharge.
by Shunfu Hu
| Publisher: | Unknows |
| Published In: | 02-Sep-2011 |
| ISBN-10: | 1243426802 |
| ISBN-13: | 9781243426802 |
| Binding Type: | Paperback |
| Weight: | 339 gms |
| Pages: | pp. 148, 50:B&W 7.44 x 9.69 in or 246 x 189 mm (Crown 4vo) Perfect Bound on White w/Gloss |
The Title "Design of atmospheric pressure plasma CVD process for deposition of silicon nitride thin films using dielectric barrier discharge." is written by Shunfu Hu. This book was published in the year 0220. The ISBN number 1243426802|9781243426802 is assigned to the Paperback version of this title. This book has total of pp. 148 (Pages). The publisher of this title is Unknows. Design of atmospheric pressure plasma CVD process for deposition of silicon nitride thin films using dielectric barrier discharge. is currently Not Available with us.You can enquire about this book and we will let you know the availability.