Development and advanced characterization of novel chemically amplified resists for next generation lithography.
by Cheng-Tsung Lee
| Publisher: | Unknows |
| Published In: | 08-Sep-2011 |
| ISBN-10: | 1243709049 |
| ISBN-13: | 9781243709042 |
| Binding Type: | Paperback |
| Weight: | 701 gms |
| Pages: | pp. 300 |
The Title "Development and advanced characterization of novel chemically amplified resists for next generation lithography." is written by Cheng-Tsung Lee. This book was published in the year 0820. The ISBN number 1243709049|9781243709042 is assigned to the Paperback version of this title. This book has total of pp. 300 (Pages). The publisher of this title is Unknows. Development and advanced characterization of novel chemically amplified resists for next generation lithography. is currently Not Available with us.You can enquire about this book and we will let you know the availability.