High-K dielectric depositions (aluminum oxide) using ozone-based ALD (atomic layer deposition) for graphene-based devices .
by Bongki Lee
| Publisher: | Unknows |
| Published In: | 09-Sep-2011 |
| ISBN-10: | 1243793279 |
| ISBN-13: | 9781243793270 |
| Binding Type: | Paperback |
| Weight: | 446 gms |
| Pages: | pp. 188 |
The Title "High-K dielectric depositions (aluminum oxide) using ozone-based ALD (atomic layer deposition) for graphene-based devices ." is written by Bongki Lee. This book was published in the year 0920. The ISBN number 1243793279|9781243793270 is assigned to the Paperback version of this title. This book has total of pp. 188 (Pages). The publisher of this title is Unknows. High-K dielectric depositions (aluminum oxide) using ozone-based ALD (atomic layer deposition) for graphene-based devices . is currently Not Available with us.You can enquire about this book and we will let you know the availability.